ALD features superb step coverage performance. The SEM images show

Highly conductive and flexible fiber for textile electronics obtained by extremely low-temperature atomic layer deposition of Pt

Thomas HECHT, Infineon Technologies, Neubiberg

Area-Selective Etching of Poly(methyl methacrylate) Films by Catalytic Decomposition

Saturation profile based conformality analysis for atomic layer deposition: aluminum oxide in lateral high-aspect-ratio channels - Physical Chemistry Chemical Physics (RSC Publishing) DOI:10.1039/D0CP03358H

Surface modification and functionalization of powder materials by atomic layer deposition: a review - RSC Advances (RSC Publishing) DOI:10.1039/D1RA00326G

Frontiers Commonalities of Atomic Layer Deposition of Oxide Coatings on Activated Carbons for 3.5 V Electric Double Layer Supercapacitors

Semidprolab

Investigation of the initial deposition steps and the interfacial layer of Atomic Layer Deposited (ALD) Al2O3 on Si - ScienceDirect

S. Kudelka's research works Infineon Technologies, Neubiberg and other places

Nucleation, Growth Mechanism, and Controlled Coating of ZnO ALD onto Vertically Aligned N-Doped CNTs

Enhanced stability and activity towards photocatalytic CO2 reduction via supercycle ALD of Cu and TiO2 - ScienceDirect

Tan and Cardinal October 27, 1972 by Otterbein University - Issuu

Enhanced stability and activity towards photocatalytic CO2 reduction via supercycle ALD of Cu and TiO2 - ScienceDirect

PDF) Atomic Layer Deposition for advanced DRAM applications